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UCF/CREOL Leica EBPG5000+ Electron Beam Lithography System
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Pictures of devices and structures fabricated by Leica EBPG5000+ E-beam System
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Type
Name
Picture Size
File Size
57nm vias with 100nm period
795 x 628
85 KB
Antenna loop
640 x 480
302 KB
Bolometer_alignment
640 x 480
263 KB
cross_hatched_lines
300 x 300
85 KB
Flower
1600 x 1200
817 KB
Junctions_1
2048 x 1536
178 KB
Sub-50nm junction
1024 x 800
802 KB